Non-oxidizing constant temperature device HISPEC N type
Achieve improved workability with a high N2 gas replacement rate, reduced N2 gas usage, and shortened temperature drop time.
Heat treatment of electronic components with copper and silver electrodes is conducted in a nitrogen gas atmosphere to prevent oxidation. The HISPEC N type constant temperature chamber developed by Kusumoto Chemical Co., Ltd. in the Etak division is a dedicated chamber designed for such specialized heat treatment. ○ Features - Guarantees residual oxygen concentration below 100 ppm - Improved productivity through enhancements in the temperature drop mechanism - Uniformity of temperature improves the yield of heat treatment *For more details, please refer to the PDF or feel free to contact us.
- Company：アズサイエンス 松本本社
- Price：Other
